Development of Ultra-High-Current Implanter for Material Modification Process in Next Era Devices
by Hiroaki Kai

The Detail Analysis of Behavior of Heavy Metals In 4H-SiC
by Ryota Wada

Beam Shape Control System by Machine-Learning on the NISSIN BeyEX Medium Current Ion Implanter
by Shinya Takemura

IMPHEAT-II, A Novel High Temperature Ion Implanter for SiC Power Devices
by Yusuke Kuwata

A Newly Developed ECR Ion Source with Wide Dynamic Range of Beam Current
by Suguru Itoi

New Control System of the Multiple Filaments in the Large Ion Source for Ion Doping System iG6 Ver.2
by Yuya Hirai