Ion implanters for semiconductor manufacturing
EXCEED9600A Series
A medium-current ion implanter with a proven track record for high productivity and process reliability that can handle nano technology nodes.
Merit
A model that contributes to optimal line configuration
- An all-rounder that includes high-energy implantation capabilities
The world’s highest productivity
- A transport system that handles thin wafers and other diverse various substrates
- Improved low-energy beam current
- Average autotune time of less than 2 minutes
Implantation quality proven in the marketplace
- Complete elimination of energy contamination
- Horizontal/vertical beam angle feedback mechanism: multipoint Faraday system
Evolution on the same platform
- Improved performance with minimal risk by maintaining reliability, process compatibility, and part compatibility
