Ion implanter for semiconductor manufacturing
LUXiON
A high-current ion implanter that realized high productivity with specialty ions such as fluorine, as well as conventional dopants.
Merit
High-current ion implanter that offers low metal contamination with high productivity.
- High productivity enabled by a large-area beam, leveraging technology from FPD ion implanters that dominate the flat-panel industry.
- Low metal contamination.
- Available wafer size : 12 inches
A fusion of innovation and reliability.
- Large-area beam technology that dominates the flat-panel industry.
- This tool incorporates proven technology and expertise from our long-selling medium-current ion implanter.
