We are pleased to announce that Yuya Uchida, a researcher at our company, has been honored with the Poster Award at ADMETA 2025 (Advanced Metallization Conference 2025), an international conference focused on semiconductor interconnect and advanced packaging technologies, held in Tokyo from October 8 through 10, 2025.
The awarded presentation, entitled \u201cEnhancement of CMP Removal Rate of SiC by Ion Implantation,\u201d provided experimental validation that ion beam-based material modification can significantly enhance the removal rate in the chemical mechanical polishing (CMP) of SiC wafers. This work presents a novel and highly promising approach to improving CMP efficiency for silicon carbide-an exceptionally hard material that presents substantial processing challenges-while eliminating the need for oxidizing agents. The research was highly regarded for both its technical rigor and its potential industrial impact.
We remain committed to advancing the global semiconductor industry through the development and delivery of innovative, high-value manufacturing solutions, thereby fostering our customers\u2019 continued growth and contributing to the realization of a sustainable society.<\/p>\n","protected":false},"excerpt":{"rendered":"
We are pleased to announce that Yuya Uchida, a researcher at our company, has been honored with the Poster Award at ADMETA 2025 (Advanced Metallization Conference 2025), an international conference focused on semiconductor interconnect and advanced packaging technologies, held in Tokyo from October 8 through 10, 2025.The awarded presentation, entitled \u201cEnhancement of CMP Removal Rate of SiC by Ion Implantation,\u201d provided experimental validation that ion beam-based material modification can significantly enhance the removal rate in the chemical mechanical polishing (CMP) of SiC wafers. This work presents a novel and highly promising approach to improving CMP efficiency for silicon carbide-an exceptionally hard material that presents substantial processing challenges-while eliminating the need […]<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[1],"tags":[],"class_list":["post-1668","post","type-post","status-publish","format-standard","hentry","category-news"],"acf":[],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1668"}],"collection":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/comments?post=1668"}],"version-history":[{"count":3,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1668\/revisions"}],"predecessor-version":[{"id":1673,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1668\/revisions\/1673"}],"wp:attachment":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/media?parent=1668"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/categories?post=1668"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/tags?post=1668"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}