{"id":1501,"date":"2024-09-05T17:34:49","date_gmt":"2024-09-05T08:34:49","guid":{"rendered":"https:\/\/www.nissin-ion.co.jp\/en\/?p=1501"},"modified":"2024-09-06T14:42:04","modified_gmt":"2024-09-06T05:42:04","slug":"24th-international-conference-on-ion-implantation-technology-2024-24th-iit-2024-will-take-place-in-toyama-from-september-23-to-26","status":"publish","type":"post","link":"https:\/\/www.nissin-ion.co.jp\/en\/event-news\/news\/24th-international-conference-on-ion-implantation-technology-2024-24th-iit-2024-will-take-place-in-toyama-from-september-23-to-26\/","title":{"rendered":"24th International Conference on Ion Implantation Technology 2024 (24th IIT 2024), will take place in Toyama from September 23 to 26."},"content":{"rendered":"\n<p>The following paper will be presented at the International Ion Implantation Conference (IIT2024).<\/p>\n\n\n\n<p>Please join us. For details, please refer to \u201c<a href=\"https:\/\/smartconf.jp\/content\/iit2024\">here<\/a>\u201d.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Plenary Talk<\/h2>\n\n\n\n<p>\u30fb<strong>Japanese Equipment Manufactures Contribution to Ion Implantation for Semiconductor Device Fabrication<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Nobuo Nagai<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Oral Talk<\/h2>\n\n\n\n<p>\u30fb<strong>IMPHEAT-\u2161:In-Situ XRD System, Enhancement of Implantation Angle Accuracy through Per-Wafer Measurement of Off-Axis Angle for Channeling Implantation<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Yuya Hirai<\/p>\n\n\n\n<p>\u30fb<strong><strong>IMPHEAT-\u2161:<\/strong>A novel Ion Source with Extended Lifetime and Wide Beam Current Dynamic Range for SiC Power Device Mass Production<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Yuta Iwanami<\/p>\n\n\n\n<p>\u30fb<strong>High Current Metal Ion Source for Material Modification in the Semiconductor Manufacturing Processes<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Takeshi Matsumoto<\/p>\n\n\n\n<p>\u30fb<strong>Molecular Ion Beam Current Enhancement by Noble Gas Mixed Discharge.<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Naoki Miyamoto<\/p>\n\n\n\n<p>\u30fb<strong>Machine Learning Based Beam Shape Controlling System on NISSIN Medium Current Ion Implanter<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Shinya Takemura<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Poster Presentation<\/h2>\n\n\n\n<p>\u30fb<strong>Ion Doping System iG8 for Generation 8 Flat-Panel Display Industry<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Kazuki Kawase<\/p>\n\n\n\n<p>\u30fb<strong>New Operation Method for Ion Source Parameters to Improve Single Ionization Efficiency<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Hiroaki Kai<\/p>\n\n\n\n<p>\u30fb<strong>Space Charge Neutralization System for Low-Energy High-Current Implanter<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Taido Kurauchi<\/p>\n\n\n\n<p>\u30fb<strong>Effect of Gas Introduction for Beam Neutralization on Beam Transport for Different Ion Species<\/strong><\/p>\n\n\n\n<p>\u3000\u3000by Yusuke Kuwata<\/p>\n\n\n\n<p><\/p>\n","protected":false},"excerpt":{"rendered":"<p>The following paper will be presented at the International Ion Implantation Conference (IIT2024). Please join us. For details, please refer to \u201chere\u201d. Plenary Talk \u30fbJapanese Equipment Manufactures Contribution to Ion Implantation for Semiconductor Device Fabrication \u3000\u3000by Nobuo Nagai Oral Talk \u30fbIMPHEAT-\u2161:In-Situ XRD System, Enhancement of Implantation Angle Accuracy through Per-Wafer Measurement of Off-Axis Angle for Channeling Implantation \u3000\u3000by Yuya Hirai \u30fbIMPHEAT-\u2161:A novel Ion Source with Extended Lifetime and Wide Beam Current Dynamic Range for SiC Power Device Mass Production \u3000\u3000by Yuta Iwanami \u30fbHigh Current Metal Ion Source for Material Modification in the Semiconductor Manufacturing Processes \u3000\u3000by Takeshi Matsumoto \u30fbMolecular Ion Beam Current Enhancement by Noble Gas Mixed Discharge. \u3000\u3000by Naoki [&hellip;]<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[1],"tags":[],"class_list":["post-1501","post","type-post","status-publish","format-standard","hentry","category-news"],"acf":[],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1501"}],"collection":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/comments?post=1501"}],"version-history":[{"count":3,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1501\/revisions"}],"predecessor-version":[{"id":1506,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/posts\/1501\/revisions\/1506"}],"wp:attachment":[{"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/media?parent=1501"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/categories?post=1501"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.nissin-ion.co.jp\/en\/wp-json\/wp\/v2\/tags?post=1501"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}