Business & Products Information

Ion Implanter for FPD(LTPS) Process

iG4

Provide the optimum machines for manufacturing low-temperature poly silicon display

iG4

Features

  • Mass separation
  • Contamination free
  • High precise
  • High repeatability
  • Wide range (from S/D to Vth)
  • Short beam setup time
  • Alternative scan cooling system
  • Ion beam charge neutralization system

Specification

Glass size

  • 730×920mm

Gas

  • PH3/H2, BF3

Beam energy

  • 10~100keV

Dimension

  • 4.0×8.2×3.0(m)

Inquiries by e-mail

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